FIELD: electrical engineering.
SUBSTANCE: invention relates to production of semiconductor devices, particularly, to manufacturing technology of solar energy converter. Method of making a semiconductor device with a structure with p, i, n layers, involving doping processes, wherein formation of the i-layer in the p-i-n structure is carried out in three steps: first step – deposition of Si:H films at rate of 0.3 nm/s, at HF power of 8 W, with flow rate SiH4 20 cm3/s and pressure 27 Pa; second step – deposition of Si:H films at rate of 0.6 nm/s, at HF power of 15 W, with flow rate of SiH4 50 cm3/s and pressure of 45 Pa, third stage – deposition of Si:H films at rate of 1.0 nm/s, at HF power of 28 W, with flow rate of SiH4 80 cm3/s and pressure of 65 Pa, followed by doping the i-layer with boron to 0.05×10-4 % at ratio (B2H6/SiH4) 10-4 % in gas mixture.
EFFECT: invention provides higher efficiency, manufacturability, improved parameters of devices, higher quality and higher percentage yield.
1 cl, 1 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD FOR OPTIMIZING PARAMETERS OF FILM DEPOSITION ON SUBSTRATES | 1995 |
|
RU2086038C1 |
METHOD FOR PREPARING PHOTOACTIVE MULTILAYER HETEROSTRUCTURE OF MICROCRYSTALLINE SILICONE | 2013 |
|
RU2599769C2 |
METHOD OF MANUFACTURE OF SEMICONDUCTOR STRUCTURES | 2017 |
|
RU2654819C1 |
METHOD FOR MANUFACTURING A THIN-FILM TRANSISTOR | 2020 |
|
RU2749493C1 |
METHOD FOR INCREASING EFFICIENCY OF DOPING AND CHANGING CONDUCTIVITY TYPE OF AMORPHOUS HYDROGENATED SILICON SLIGHTLY DOPED WITH ACCEPTOR IMPURITIES | 2016 |
|
RU2660220C2 |
METHOD OF MAKING SEMICONDUCTOR DEVICE | 2015 |
|
RU2584273C1 |
METHOD FOR MANUFACTURING A RADIATION-RESISTANT SEMICONDUCTOR INSTRUMENT | 2021 |
|
RU2785122C1 |
METHOD OF MAKING SEMICONDUCTOR STRUCTURE | 2014 |
|
RU2586009C1 |
METHOD FOR MANUFACTURING A SEMICONDUCTOR APPARATUS | 2020 |
|
RU2755175C1 |
METHOD FOR PRODUCTING THIN FILMS OF AMORPHOUS HYDROGENATED SILICON | 1993 |
|
RU2061281C1 |
Authors
Dates
2019-08-28—Published
2019-03-06—Filed