FIELD: chemistry.
SUBSTANCE: invention relates to a method and a device for layer-by-atom deposition of a coating onto a substrate surface. Sequence of atomic layer deposition is carried out, including at least one deposition cycle, wherein in each cycle a monolayer of deposited material is formed. Deposition cycle includes delivery of at least particles of the first precursor and particles of the second precursor to the surface of the substrate in the reaction chamber. Particles of the first precursor and particles of the second precursor are simultaneously present in the reaction chamber in the gaseous phase. Deposition cycle includes activation period and regeneration period, wherein during the period of activation, particles of the first precursor adsorbed on the surface of the substrate during the previous regeneration period, switch to the excited state under photon energy, as a result of which adsorbed particles of first precursor react on surfaces with particles of second precursor, which is in gaseous phase. During the next period of regeneration, the particles of the first precursor, which is in the gaseous phase, react with particles of the second precursor adsorbed on the surface during the activation period. Said device has a reaction chamber, at least one feed line and a control system for controlling the apparatus for performing a sequence of atomic layer deposition. Control system is additionally designed to ensure simultaneous presence of vapours containing particles of the first precursor and particles of the second precursor in gaseous phase in the reaction chamber. Device has a source of photons for excitation during the period of activation under action of energy of photons of particles of the first precursor adsorbed on the surface of the substrate during the previous period of regeneration.
EFFECT: higher rate of atomic layer deposition, lower processing temperature and simplified use of chemicals.
16 cl, 12 dwg
