METHOD OF ELECTRON-BEAM BACKFILLING WITH CONTROL OF FILLER WIRE POSITION RELATIVE TO ELECTRON BEAM (VERSIONS) Russian patent published in 2019 - IPC B23K15/02 H01J37/304 H01J37/305 

FIELD: technological processes.

SUBSTANCE: invention relates to a method for electron-beam surfacing with rapid monitoring of the position of filler wire relative to the electron beam. Proposed method comprises the steps whereat electron-beam build-up is performed with continuous oscillation of electron beam along trajectory intersected with filler wire. During surfacing, braking X-ray radiation or secondary high-energy electrons or light emission is measured from zone of interaction of electron beam with article material and filler wire. Signal of secondary radiation is processed by synchronous accumulation or synchronous detection method. A value characterizing the delay of the secondary radiation signal relative to the current signal in the deflecting coils or a value characterizing the deflection of the filler wire from the required position is selected and measured. Electronic deflecting system and/or filler wire positioning system are controlled by maintaining values of said values at level corresponding to required position of filler wire relative to electron beam.

EFFECT: disclosed are a method of electron-beam backfilling with control of the position of filler wire relative to the electron beam and versions.

4 cl, 5 dwg, 1 tbl