METHOD OF CREATING A TWO-DIMENSIONAL FERROMAGNETIC MATERIAL OF GADOLINIUM DISILICIDE WITH A STRUCTURE OF INTERCALATED SILICENE LAYERS Russian patent published in 2019 - IPC C30B23/08 C30B23/06 C30B29/10 C01B33/06 C01F17/00 C23C14/06 C23C14/16 C23C14/34 C23C14/54 H01L21/20 H01F41/30 B82B3/00 B82Y30/00 B82Y40/00 

FIELD: technological processes.

SUBSTANCE: invention relates to production of two-dimensional magnetic materials for ultra-compact spintronic devices. Method of producing gadolinium disilicide GdSi₂ with structure of intercalated silicene layers by molecular-beam epitaxy is in deposition of atomic flow of gadolinium with pressure P_Gd (from 0.1 to less than 1)⋅10^-8 Torr or P_Gd (from more than 1 to 10)⋅10^-8 Torr on pre-cleaned surface of Si(111) substrate, heated to T_s=350 ÷ less than 400 °C or T_s= more than 400÷450 °C, to formation of gadolinium disilicide film with thickness of not more than 7 nm.

EFFECT: formation of epitaxial films of two-dimensional magnetic material GdSi₂ crystalline modification of hP3 with structure of intercalated gadolinium of multilayer silicene on silicon substrates, such structures are homogeneous in thickness, do not contain extraneous phases, are ferromagnetic.

1 cl, 5 dwg, 4 ex