FIELD: medicine.
SUBSTANCE: invention relates to a method for producing X-ray lithography mask. X-ray mask manufacturing method includes processes of formation of topological masking X-ray absorbing layer by perforation of metal foil and its fixation in support ring. On one of the surfaces of the metal foil a protective mask is made of metal having a low etching rate compared to the foil metal in the corresponding chemically active plasma etching foil metal, then foil is placed on cooled table of plasma chemical etching and through holes are etched in foil through protective mask by action of flow of chemically active ions.
EFFECT: as result, X-ray lithography mask produced in this manner does not contain a bearing membrane and therefore is characterized by maximum achievable levels of X-ray lithographic contrast (with given material and thickness of masking layer), as well as relatively high mechanical strength.
5 cl, 5 dwg
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Authors
Dates
2020-05-18—Published
2019-04-16—Filed