METHOD FOR PRODUCING A SELF-SUPPORTING X-RAY MASK Russian patent published in 2021 - IPC G03F7/00 G01F1/22 

FIELD: X-ray technology.

SUBSTANCE: invention relates to X-ray lithography. The method for producing a self-supporting X-ray mask includes the processes of forming, by lithographic methods, a protective mask on one surface of the metal foil, made of a metal with a low etching rate in the corresponding composition of the reactive plasma etching the metal foil, compared with the metal of the foil, the processes of preliminary straightening of the foil and fixation thereof by means of an adhesive substance on a metal plate installed on the working table of a plasma-chemical etching unit, the process of through etching of the foil through the protective mask in the plasma-chemical etching unit, wherein, according to the invention, liquid gallium metal is used as an adhesive substance fixing the foil on the metal plate, followed by solidification thereof during the cooling of the assembly: foil, gallium metal, metal plate - to a temperature below the melting point of gallium (T_melt=29.78°C).

EFFECT: invention excludes distortion of the foil and changes in the properties of the resist.

3 cl, 5 dwg