FIELD: manufacturing technology.
SUBSTANCE: invention relates to material science of semiconductors and can be used to produce segments of filament-like nanocrystals of InxGa1-xN. Method of forming filamentary nanocrystals InxGa1-xN, where x=0.2–0.8, stable in the region of metastable compositions, is carried out using metal chloride epitaxy from the gas phase at atmospheric pressure in the reactor using gas precursors GaCl and InCl3, during which maintaining temperature in reactor 660 °C with allowable deviation ± up to 10 °C and monitoring the In content in the solid phase inside the filamentary nanocrystals by varying the ratio of precursor gas streams of group III GaCl and InCl3 elements, and maintaining flow ratio of NH3 group precursor V to total flow of said group III precursors within 26.
EFFECT: high stability of the nanocrystalline structure while increasing indium content in the structure.
1 cl, 3 dwg, 1 tbl
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Authors
Dates
2020-06-08—Published
2019-09-04—Filed