FIELD: vacuum deposition.
SUBSTANCE: invention relates to elements of in-chamber devices of vacuum spraying installations and can be used when applying metal and semiconductor films to cover parts and elements used in electronic, instrument-making and optical industry products, as well as for obtaining experimental and test samples in research activities. The movable flap of the vacuum spraying installation for the formation of thin films of various configurations is characterized by the fact that it has an opening for its attachment to the mechanism of entry and movement inside the working chamber, windows in the form of longitudinal, round and transverse slots and a window for spraying on the witness substrate, which is always in the open position, and a positioning mechanism made with the possibility of placing a vacuum spraying unit on the lid of the working chamber. The positioning mechanism contains a positioning scale of the movable flap inside the working chamber, made with the possibility of attaching to the said lid, with tags corresponding to the positions of the windows in the form of longitudinal, round and transverse slots, and an indication arrow showing the position corresponding to the position of the movable flap inside the working chamber and made with the possibility of connecting to the mating part of the mechanism for entering and moving the movable flap outside the working chamber.
EFFECT: thin films with a given configuration are obtained in one technological cycle without de-vacuuming the installation, sample extraction and mask installation.
1 cl, 6 dwg
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Authors
Dates
2022-05-30—Published
2021-06-04—Filed