FIELD: semiconductor optoelectronics.
SUBSTANCE: present invention relates to the field of semiconductor optoelectronics. The method for manufacturing AlGaN heterostructures for solar-blind photocathodes in the ultraviolet range includes annealing a sapphire substrate at a temperature of (800-850) °C, nitriding the surface of a sapphire substrate in an activated nitrogen flow at a temperature of TS=(780-820)°C, sequential growth by plasma-activated molecular beam epitaxy of an AIN seed layer in the epitaxy mode with increased atomic migration at a temperature of TS= (780-820)°C with a thickness of (60-130) nm, an AIN buffer layer in the mode of metal-modulated epitaxy in weak metal-enriched conditions at a ratio of aluminum and nitrogen fluxes FN FAl/FN=1.05 with a thickness of 1-2 mcm and an AlGaN active layer doped with Mg in a metal-enriched mode with a continuous change in the aluminum content in the layer from 80 to 37% of the thickness (90- 160) nm at a temperature of (680-700)°C by reducing the aluminum flux during growth at a constant ratio (FAl + FGa)/FN of the fluxes of metals (FAl, FGa) and nitrogen.
EFFECT: development of a method for manufacturing AlGaN - a heterostructure for solar-blind photocathodes in the ultraviolet spectral range, which would provide high sensitivity in the spectral wavelength range less than 290 nm.
1 cl, 2 dwg
Title | Year | Author | Number |
---|---|---|---|
SOURCE OF SPONTANEOUS ULTRAVIOLET RADIATION WITH WAVELENGTH LESS THAN 250 nm | 2018 |
|
RU2709999C1 |
METHOD FOR GROWING SEMICONDUCTOR FILM | 2023 |
|
RU2814063C1 |
METHOD FOR MANUFACTURING NANO-COLUMN HETEROSTRUCTURE BASED ON III-N COMPOUNDS | 2019 |
|
RU2758776C2 |
METHOD FOR GROWING MULTILAYER SEMICONDUCTOR NITRIDE HETEROSTRUCTURE | 2006 |
|
RU2316075C1 |
PHOTOCATHODE FOR SINGLE-CHANNEL DUAL SPECTRUM EMISSION UV IMAGE RECEIVER | 2023 |
|
RU2809590C1 |
METHOD OF InGaN MULTILAYER STRUCTURE GROWTH BY PLASMA MBE | 2007 |
|
RU2344509C2 |
PHOTOSENSITIVE DEVICE AND METHOD OF ITS MANUFACTURE | 2018 |
|
RU2685032C1 |
METHOD FOR PRODUCING HETEROEPITAXIAL LAYERS OF III-N COMPOUNDS ON MONOCRYSTALLINE SILICON WITH 3C-SIC LAYER | 2020 |
|
RU2750295C1 |
PLANAR TWO-SPECTRAL PHOTOELECTRONIC MULTIPLIER | 2018 |
|
RU2692094C1 |
METHOD OF GROWING NONPOLAR EPITAXIAL HETEROSTRUCTURES BASED ON GROUP III ELEMENT NITRIDES | 2006 |
|
RU2315135C2 |
Authors
Dates
2022-10-12—Published
2021-10-25—Filed