HIGH-VOLTAGE FIELD-EFFECT TRANSISTOR WITH STATIC INDUCTION AND SOURCE FROM HETEROJUNCTION Russian patent published in 2024 - IPC H01L29/772 

Abstract RU 2824888 C2

FIELD: physics.

SUBSTANCE: proposed invention relates to semiconductor equipment and can be used in power electronics devices for conversion of electric energy parameters in transport, robotics, radio engineering devices and secondary power supply sources. Essence of the disclosed high-voltage switching semiconductor transistor with a source from a heterojunction is that the existing structure of a transistor with static induction and a vertical channel KP926 is taken as a basis, where above the low-resistance region of the first type of conductivity of silicon, which is a drain, a high-resistance region of the same type of conductivity is formed, in which a gate region of the second type of conductivity is formed, inside which low-resistance regions of sources of the first conductivity type are formed. Distinctive feature of the transistor with the proposed structure is the movement of the main carriers - electrons, due to the potential well, from aluminium to gallium arsenide and then, under the effect of the drain field, they are transformed into silicon. Their concentration will correspond to 1022⋅cm-3. With such concentration of the main carriers, the channel resistance will decrease by more than two orders in the field mode of operation of the transistor, therefore, to obtain resistance of channel 2, …, 3 mOhm, the active area of the crystal can also be reduced by two orders, which means that the control power will also be reduced by two orders. Gate capacity will decrease by two orders and, accordingly, the switching time will decrease. Since only electrons with higher mobility will participate in the transfer current, the speed of operation will also increase.

EFFECT: creation of high-voltage power transistor structure, made on one chip in order to reduce channel resistance in open state, reduction of static power losses, increase of current transfer coefficient, as well as improvement of weight and dimensions and increase of speed of operation.

1 cl, 2 dwg

Similar patents RU2824888C2

Title Year Author Number
HIGH VOLTAGE BIPOLAR TRANSISTOR WITH STATIC INDUCTION 2023
  • Gordeev Aleksandr Ivanovich
  • Voitovich Viktor Evgenevich
  • Eremianov Oleg Gennadevich
  • Maksimenko Iurii Nikolaevich
RU2805777C1
RANDOM-ACCESS MEMORY CELL 2024
  • Gordeev Aleksandr Ivanovich
  • Voitovich Viktor Evgenevich
RU2826859C1
HIGH-VOLTAGE HIGH-TEMPERATURE QUICK-ACTING THYRISTOR WITH FIELD CONTROL 2010
  • Vojtovich Viktor Evgen'Evich
  • Gordeev Aleksandr Ivanovich
  • Dumanevich Anatolij Nikolaevich
RU2472248C2
HETEROSTRUCTURE MODULATED-DOPED FIELD-EFFECT TRANSISTOR 2013
  • Avetisjan Grachik Khachaturovich
  • Dorofeev Aleksej Anatol'Evich
  • Kolkovskij Jurij Vladimirovich
  • Minnebaev Vadim Minkhatovich
RU2534437C1
STATIC-INDUCTION INTEGRATED FIELD-EFFECT SCHOTTKY- BARRIER TRANSISTOR 2000
  • Konoplev B.G.
  • Ryndin E.A.
RU2183885C1
METHOD OF MAKING MICROWAVE FIELD-EFFECT TRANSISTOR 2012
  • Blinov Gennadij Andreevich
  • Butenko Elena Vasil'Evna
RU2523060C2
INTEGRATED-CIRCUIT FIELD-EFFECT TRANSISTOR USING DIMENSIONAL ENERGY QUANTIZATION 2004
  • Konoplev B.G.
  • Ryndin E.A.
RU2257642C1
BIPOLAR COMBINED-GATE FIELD-EFFECT TRANSISTOR 2002
  • Vorob'Eva T.A.
  • Gurin N.T.
  • Gordeev A.I.
  • Obmajkin Ju.D.
  • Andreeva E.E.
RU2230394C1
MODULATION-DOPED FIELD-EFFECT TRANSISTOR 2013
  • Avetisjan Grachik Khachaturovich
  • Dorofeev Aleksej Anatol'Evich
  • Kolkovskij Jurij Vladimirovich
  • Minnebaev Vadim Minkhatovich
RU2539754C1
DEVICE FOR PROTECTION AGAINST STATIC ELECTRICITY DISCHARGES OF POWER LEADS OF COMPLEMENTARY MOS (METAL-OXIDE-SEMICONDUCTOR) INTEGRATED CIRCUITS ON SILICON WAFERS WITH N-TYPE CONDUCTIVITY 2013
  • Guminov Vladimir Nikolaevich
  • Abramov Sergej Nikolaevich
RU2585882C2

RU 2 824 888 C2

Authors

Maksimenko Yurij Nikolaevich

Grabezhova Viktoriya Konstantinovna

Gordeev Aleksandr Ivanovich

Dates

2024-08-15Published

2023-01-25Filed