FIELD: coating application.
SUBSTANCE: invention relates to a method for forming transparent conductive layers based on indium oxide doped with zinc. Magnetron sputtering of a composite target consisting of indium oxide and zinc oxide is carried out, and the sputtered material is deposited onto the substrate to form a continuous film. During the sputtering process, the oxygen content in the composition of the working gas is periodically changed, while deposition is carried out on a substrate heated to a temperature of no more than 100°C. Formation of a thickness-modulated film is ensured, consisting of alternating regions with high and low concentrations of oxygen vacancies.
EFFECT: multilayer modulated structure based on a single material, due to no heterointerfaces between individual layers, is free from problems associated with mismatch stresses.
1 cl, 1 tbl, 1 ex
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RU2433504C2 |
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RU2505888C1 |
Authors
Dates
2024-01-30—Published
2023-10-11—Filed