FIELD: technology for manufacturing semiconductor devices, possible use for manufacturing integration circuits on semiconductors A3B5.
SUBSTANCE: electrolyte contains dimethylformamide, ammonium persulphate and glycerin. Also, electrolyte additionally contains halogen-containing salt of ammonium, namely, fluorine ammonium or chlorine ammonium with following ratio of ingredients in percents of weight: dimethylformamide - 50-80, ammonium persulphate - 0,3-0,5, halogen-containing salt of ammonium - 0,0001-0,1, glycerin - the rest.
EFFECT: decreased density of surface state at boundary limit between semiconductor and anodic oxide.
Title | Year | Author | Number |
---|---|---|---|
ELECTROLYTE FOR ANODIC OXIDATION OF INDIUM ANTIMONIDE | 1979 |
|
SU1840205A1 |
ELECTROLYTE FOR ANODIC OXIDATION OF TYPE АВ SEMICONDUCTORS | 1977 |
|
SU1840202A1 |
ELECTROLYTE FOR ANODIC OXIDATION OF SEMICONDUCTOR COMPOUNDS BASED ON AB | 2016 |
|
RU2621879C1 |
METHOD FOR PRODUCING INSULATING FILMS FOR MIS STRUCTURES BUILT AROUND SEMICONDUCTOR JUNCTIONS AB | 1978 |
|
SU1840204A1 |
SEMICONDUCTOR DEVICE | 1980 |
|
SU1840207A1 |
METHOD FOR PRODUCING INSULATING FILMS FOR MIS STRUCTURES BASED ON INDIUM ARSENIDE AND ITS SOLID SOLUTIONS | 1984 |
|
SU1840172A1 |
METHOD FOR ANODIC OXIDATION OF TYPE АВ SEMICONDUCTORS | 1979 |
|
SU1840206A1 |
METAL-DIELECTRIC-SEMICONDUCTOR STRUCTURE BASED ON AB COMPOUNDS AND ITS FORMATION METHOD | 2010 |
|
RU2420828C1 |
METHOD FOR FORMING A HYBRID DIELECTRIC COATING ON THE SURFACE OF INDIUM ANTIMONIDE ORIENTATION (100) | 2022 |
|
RU2782989C1 |
METHOD FOR PRODUCING PHOTODIODES ON INDIUM ANTIMONIDE | 2006 |
|
RU2313854C1 |
Authors
Dates
2006-08-10—Published
1976-06-07—Filed